三氟化氮(NF3)是微电子工业中优良的等离子刻蚀气体，它在潮湿的环境中能发生反应：
3NF3＋5H2O===2NO＋HNO3＋9HF。下列有关说法正确的是（ ）
| A．NF3既是氧化剂，又是还原剂 |
| B．还原剂与氧化剂的物质的量之比为1∶2 |
| C．若生成0.2 mol HNO3，则转移0.2 mol电子 |
| D．NF3在潮湿的空气中泄漏会产生无色气体 |
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